赵倩^1,2，林启民^1,2，谢程超²，杨越²

(1 内蒙古自治区白云鄂博矿多金属资源综合利用重点实验室，内蒙古包头 014010  

2 内蒙古科技大学数理与生物工程学院，内蒙古包头  014010)

关键词： TiO₂薄膜磁控溅射靶基距

中图分类号：O469；O552.5文献识别码：A

摘要：采用射频磁控溅射法制备衬底温度为750℃的不同靶基距的Mg掺杂TiO₂薄膜。利用台阶仪、X-射线衍射仪分别研究了薄膜的厚度及物相。实验结果表明：随着靶基距的减小，薄膜的厚度增加，而对于纯的TiO₂主峰的衍射峰强度增加；除了靶基距为4cm的薄膜中有锐钛矿结构的MgTi₂O₅杂相之外，其它靶基距的薄膜均为TiO₂的锐钛矿与金红石的混合相；在靶基距为6cm时锐钛矿相TiO₂的晶粒尺寸最大，大小为34nm；在靶基距为7cm时金红石相TiO₂的晶粒尺寸最大，大小为11.5nm。

Theeffect of different target-substrate distance on the thickness and structure ofMg-doped TiO₂ thin film

Qian Zhao^1,2, Qi-minLin^1,2, Cheng-chao Xie², Yue Yang²

(1 Key Laboratoryof Integrated Exploitation of Bayan Obo Multi-Metal Resources, InnerMongolia University of Science and Technology，Baotou 014010，China;

2Mathematics,Physics and Biological Engineering School, Baotou 014010, China)

Keywords:Thethin film of TiO₂  ; Magnetron sputtering; Target-substratedistance

Abstract：Mg-doped TiO₂ films withdifferent target-substrate distance were prepared by RF-magnetron sputtering at750℃ substrate temperature. The thickness andphase of the films were studied by using the step tester and X-ray diffraction,respectively. The experimental results show that the thickness and theintensity of diffraction peak from pure TiO₂ of the film increasewith the decrease of target-substrate distance. All samples are mixed phase ofanatase and rutile TiO₂ except that the film prepared under the 4cm of target-substrate distance has the second phase of anatase MgTi₂O₅. The grain size of anatase phase of TiO₂ prepared under the 6 cm of target-substrate distance is 34 nm ,which isthe biggest in all anatase phase of the prepared TiO₂; and the grainsize of rutile phase of TiO₂ under the 7cm of target-substrate distance is 11.5 nm ,which is thebiggest in all rutile phase of the prepared TiO₂.